▎ 摘　　要

NOVELTY - The optical waveguide device comprises a silicon carbide substrate (1), a graphene film (2) and atomic layer that formed on the silicon carbide substrate, where an optical wavelength zone is formed the graphene film. A transparent electric-insulation film (3) is provided in the optical wavelength zone. The transparent electric-insulation film is formed with the graphene film. USE - Optical waveguide device. ADVANTAGE - The optical waveguide device comprises a silicon carbide substrate, a graphene film and atomic layer that formed on the silicon carbide substrate, where an optical wavelength zone is formed the graphene film, and thus ensures good industrial utility value of the optical waveguide device. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for manufacturing an optical waveguide device. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional schematic view of the optical waveguide device. Silicon carbide substrate (1) Graphene film (2) Transparent electric-insulation film (3) Source electrode (5) Drain electrode (6)