▎ 摘　　要

NOVELTY - Doping method using an electric field involves stacking a sacrificial layer (300) on a doped layer (200), arranging a doping material (400) on the sacrificial layer, arranging electrodes on the doping material and doped layer, and doping the doping material into the doped layer through oxidation, diffusion and reduction of the doping material by the electric field. USE - Doping method. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for thin layer doped with doping material. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the doping process using an electric field. Substrate (100) Doped layer (200) Sacrificial layer (300) Doping material (400)