• 专利标题:   Manufacture of block copolymer using graphene film, involves laminating graphene oxide film on substrate, stacking laminated graphene oxide film and subjecting to self-assembly.
  • 专利号:   KR2012092261-A, KR1224290-B1
  • 发明人:   KIM S O, KIM B H, KIM J Y, JEONG S J, HWANG J O, LEE D H, SHIN D O
  • 专利权人:   KOREA ADV INST SCI TECHNOLOGY
  • 国际专利分类:   B82B003/00, C08F293/00, C08J005/18, C08J007/04
  • 专利详细信息:   KR2012092261-A 21 Aug 2012 C08J-005/18 201364 Pages: 18
  • 申请详细信息:   KR2012092261-A KR012189 11 Feb 2011
  • 优先权号:   KR012189

▎ 摘  要

NOVELTY - Method for manufacturing block copolymer using graphene film, involves laminating graphene oxide film on substrate, stacking the laminated graphene oxide film and subjecting to self-assembly. USE - The method is used for manufacturing block copolymer for manufacture of metal nanodot. The block copolymer is one of polystyrene-block-poly(methacrylate) (PS-b-PMMA), polystyrene-block-poly(ethylene oxide) (PS-b-PEDs), polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) and polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) (all claimed). DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) block copolymer film manufactured by the above-cited method; and (2) method for manufacturing metal nanodot, involves selectively removing a portion of the nano region of the block copolymer film, laminating the metal on mold, lifting-off and removing the block copolymer mold.