▎ 摘　　要

NOVELTY - Preparing a single-atom catalyst comprising placing the cleaned raw material in a vacuum oven for drying to generate a metal precursor, when the raw material of the metal precursor does not include a metal salt, cleaning the raw material, placing the preset carrier material and the metal precursor in a plasma-enhanced chemical vapor deposition apparatus plasma enhanced chemical vapor deposition for plasma enhanced chemical vapor deposition processing to generate a single-atom catalyst. USE - The method is useful for preparing a single-atom catalyst. ADVANTAGE - The method and device have the advantages of simple preparation steps, convenient operation, short process time, low-cost and easy-to-obtain reaction precursor materials, suitable for large-scale production, and can be extended to a variety of metal precursors (non-precious metals and precious metals) and a variety of carriers Materials (carbon-based and non-carbon-based materials), with better universality. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for an apparatus for preparing a monoatomic catalyst, comprising a first generation module used for cleaning the raw material when the raw material of the metal precursor does not include a metal salt, and cleaning the raw material after the cleaning process, dring raw materials in a vacuum oven to generate a metal precursor, and placing second generation module by preset carrier material and the metal precursor in plasma enhanced chemical vapor deposition for plasma enhanced chemical vapor deposition processing to generate a single-atom catalyst.