▎ 摘　　要

NOVELTY - Forming a graphene film, comprises: depositing a non-gaseous carbon source onto a catalyst surface; exposing the non-gaseous carbon source to at least one gas, where the gas comprises a gas flow rate; and initiating the conversion of the non-gaseous carbon source to the graphene film, where the thickness of the graphene film is controllable by the gas flow rate. USE - The method is useful for forming a graphene film (claimed) for optoelectronics. ADVANTAGE - The method: provides the graphene films with low defects, low sheet resistance and ambipolar field effects; and enables the formation of easily transferable graphene films with desirable sizes, thicknesses and patterns by utilizing cost-effective/inexpensive non-gaseous carbon sources. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene film made by the method.