• 专利标题:   Microelectronic structure, has substrate formed with multiple microelectronic assembly, and insulating layer formed between electrode and graphene layer, where insulating layer includes multiple isolation layers defining range of assembly.
  • 专利号:   CN107346780-A, TW600164-B1, TW201740571-A
  • 发明人:   XIAO D, ZHANG R, CHANG R
  • 专利权人:   ZING SEMICONDUCTOR CORP, ZING SEMICONDUCTOR CORP
  • 国际专利分类:   H01L021/28, H01L021/336, H01L029/06, H01L029/16, H01L029/417, H01L029/423, H01L029/78
  • 专利详细信息:   CN107346780-A 14 Nov 2017 H01L-029/06 201780 Pages: 10 Chinese
  • 申请详细信息:   CN107346780-A CN10293052 05 May 2016
  • 优先权号:   CN10293052

▎ 摘  要

NOVELTY - The structure has a substrate formed with multiple microelectronic assemblies. The microelectronic assembly respectively includes a graphene layer and three electrodes. First and second electrodes are directly contacted with two ends of the graphene layer. A first insulating layer is arranged between the graphene layer and the substrate. A second insulating layer is formed between a third electrode and the graphene layer, where bandgap of the graphene layer is greater than 300meV. The second insulating layer includes multiple isolation layers defining a range of the microelectronic assembly. USE - Microelectronic structure. ADVANTAGE - The structure uses a high energy graphene material so as to improve electronic characteristics. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a microelectronic structure forming method. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a microelectronic structure forming method. '(Drawing includes non-English language text)'