• 专利标题:   Detecting residual metal ion in quantum dot involves adding fluorescence intensity before and after metal ion standard solution according to UV irradiation and non-ultraviolet irradiation functional graphene quantum dot solution.
  • 专利号:   CN113959994-A
  • 发明人:   LU Z, DENG C
  • 专利权人:   TCL TECHNOLOGY GROUP CORP
  • 国际专利分类:   G01N021/64
  • 专利详细信息:   CN113959994-A 21 Jan 2022 G01N-021/64 202224 Chinese
  • 申请详细信息:   CN113959994-A CN10700588 20 Jul 2020
  • 优先权号:   CN10700588

▎ 摘  要

NOVELTY - Detecting residual metal ions in quantum dots comprises adding fluorescence intensity before and after the metal ion standard solution according to the UV irradiation and non-ultraviolet irradiation functional graphene quantum dot solution, adding fluorometric intensity, determining the corresponding relationship between the concentration of the metal ions and the response value R2, and determining the remaining metal ion concentration in the quantum dots solution to be tested. USE - Method for detecting residual metal ion in quantum dot used as multifunctional fluorescent probe and universal fluorescent marking platform in material science, biological imaging and analyzing chemical center. ADVANTAGE - The method can efficiently and quickly detect whether the quantum dot contains the residual metal ion, and can quickly calculate the concentration of the residual ion according to the linear equation, so as to judge the metal ion in the synthesized quantum dot is completely cleaned. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating the detecting residual metal ion in quantum dot (Drawing includes non-English language text).