▎ 摘　　要

NOVELTY - Composition (C1) comprises chemical contrast pattern having a first region of a first chemistry on a background of a second chemistry, and microphase-separated block copolymer material overlying the chemical contrast pattern, where the first chemistry is preferential to a first block of the block copolymer material and the second chemistry is preferential to a second block of the block copolymer material, and at least three domains of the microphase-separated block copolymer material are oriented vertically to and aligned over the first region, and the first chemistry is a non-two-dimensional material. USE - The composition is useful for forming thin film (claimed). ADVANTAGE - The composition: has density multiplication of 3.5 is achieved after annealing for roughly 24 hours, 10 minutes, 2.5 minutes and 30 seconds at 130-190 degrees C; and ensures impart ionic or electronic conductivity, etch resistant material to increase etch selectivity and increase stretchability or compressability of the BCP. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (1) composition (C2) comprising chemical contrast pattern having a first region of a first chemistry on a background of a second chemistry, and a microphase-separated block copolymer material overlying the chemical contrast pattern, where the first chemistry is preferential to a first block of the block copolymer material and the second chemistry is preferential to a second block of the block copolymer material, and at least three domains of the microphase-separated block copolymer material are oriented vertically to and aligned over the first region, the first chemistry comprises polymers, organic small molecules, self-assembled monolayers, non-graphene carbon or metal nitrides; (2) composition (C3) comprising chemical contrast pattern and microphase-separated block copolymer material overlying the chemical contrast pattern, where the first chemistry is preferential to a first block of the block copolymer material and the second chemistry is preferential to a second block of the block copolymer material, at least three domains of the microphase-separated block copolymer material are oriented vertically to and aligned over the first region, and the first chemistry includes closed bonds only in one-dimension; (3) composition (C4) comprising a chemical contrast pattern having a first region of a first chemistry on a background of a second chemistry, and a microphase-separated block copolymer material overlying the chemical contrast pattern, where the first chemistry is preferential to a first block of the block copolymer material and the second chemistry is preferential to a second block of the block copolymer material, and where at least three domains of the microphase-separated block copolymer material are oriented vertically to and aligned over the first region, and the first chemistry includes a three-dimensional bonding network; (4) forming thin film comprising at least one region of first chemistry on a background of second chemistry, and coating the chemical contrast pattern with a material comprising a block copolymer (BCP) having a length scale L0, where the first region has a smallest dimension that is at least 2.5 L0, and inducing assembly of the BCP to form thin film comprising microphase-separated BCP material overlying the chemical contrast pattern, at least three domains of the microphase-separated BCP are oriented vertically to and aligned over at least one region of the first chemistry; (5) composition (C5) comprising chemical contrast pattern having a first region of a first chemistry on a background of a second chemistry, and microphase-separated block copolymer material overlying the chemical contrast pattern, where the first chemistry is preferential to a first block of the block copolymer material and the second chemistry is preferential to a second block of the block copolymer material, and at least one domain of the microphase-separated block copolymer material are oriented vertically to and aligned over the first region and horizontal domains are over the background region; (6) composition (C6) comprising a line-array superlattice comprising many arrays of vertical lamellae of microphase-separated A-b-B block copolymer separated by horizontal lamellae of microphase-separated block copolymer, where the width of each array is nL0/2, where L0 is bulk lattice constant of the A-b-B block copolymer and n is integer; (7) composition (C7) comprising a single B lamella of A-b-B block copolymer having a width L0/2 and adjacent to horizontal lamellae of the A-b-B block copolymer on each side; and (8) composition (C8) comprising a line-array, each line comprising a single B lamella of A-b-B block copolymer having a width L0/2 and adjacent to horizontal lamellae of the A-b-B block copolymer on each side.