▎ 摘　　要

NOVELTY - The method involves transferring a graphene sheet (215) to a selected wafer (205). A metal layer (220) is deposited to a first surface of the graphene sheet and the metal layer is removed. An electron beam evaporation process is applied. The graphene sheet is dipped in a gold plating solution. The graphene sheet is washed with deionized water to remove any remaining particles from the metal layer. The metal comprises gold, ruthenium, rhodium, palladium, silver, osmium, iridium, or platinum. USE - Method for providing temporary layer on graphene sheet for biosensor and electronic applications using lithographic patterning techniques. ADVANTAGE - The graphene is allowed to be handled in a factory setting for large manufacturing production. The metal layer help to protect the graphene from being contaminated or degraded, even as the graphene is prepped and assembled for use within select graphene based devices due to inert nature of the metal layer. DESCRIPTION OF DRAWING(S) - The drawings show schematic view of a graphene sheet transferred onto a substrate and a graphene sheet with a metal layer. Wafer (205) Graphene sheet (215) Metal layer (220)