• 专利标题:   Manufacture of graphene used for graphene bending transistor, involves forming carbon layer and metal layer, heating carbon layer, forming carbon solution layer, and sublimating resultant carbon solution layer and metal layer.
  • 专利号:   WO2015163619-A1, KR2015121590-A, KR2015121680-A, KR2015121682-A, KR2015121683-A, KR2015121684-A, KR2016086305-A
  • 发明人:   LEE Y T
  • 专利权人:   LEE Y T
  • 国际专利分类:   C01B031/04, H01L041/08, H01L041/187, H01L041/22, H01L041/04
  • 专利详细信息:   WO2015163619-A1 29 Oct 2015 C01B-031/04 201578 Pages: 136
  • 申请详细信息:   WO2015163619-A1 WOKR003663 13 Apr 2015
  • 优先权号:   KR047673, KR074599, KR095626, KR095630, KR095633, KR086527

▎ 摘  要

NOVELTY - Manufacture of graphene (32) involves forming carbon layer and metal layer (31), heating carbon layer, forming carbon solution layer, sublimating resultant carbon solution layer and metal layer, and forming monolayer or multilayered graphene. USE - Manufacture of graphene used for graphene bending transistor for electronic component (all claimed). ADVANTAGE - The method enables manufacture of graphene having excellent quality and electron mobility. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) low-temperature direct growth of graphene on substrate (10); (2) graphene bending transistor; and (3) electronic component. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view explaining low-temperature direct growth of graphene on substrate. Substrate (10) Metal layer (31) Graphene (32)