• 专利标题:   Method for preparing FET e.g. junction gate JFET, involves mounting interdigital electrode on surface of graphene nanoribbon composite structure, and interdigitated electrodes cover multiple protrusions are electrically connected with multiple graphene nanoribbons.
  • 专利号:   CN114613677-A
  • 发明人:   FAN S, LI Q, JIN Y, ZHANG L, ZHANG T
  • 专利权人:   HONGFUJIN PRECISION IND SHENZHEN CO LTD, UNIV TSINGHUA
  • 国际专利分类:   B82Y030/00, B82Y040/00, H01L021/336, H01L029/06, H01L029/16, H01L029/78
  • 专利详细信息:   CN114613677-A 10 Jun 2022 H01L-021/336 202266 Chinese
  • 申请详细信息:   CN114613677-A CN11447911 09 Dec 2020
  • 优先权号:   CN11447911

▎ 摘  要

NOVELTY - The method involves providing a graphene nanoribbon composite structure, and the graphene nanoribbon composite structure includes a substrate (16) and multiple graphene nanoribbons (22). The substrate has multiple protrusions are arranged at intervals, multiple graphene nanoribbons are arranged on the substrate at intervals, and there is a graphene nanoribbon between adjacent protrusions. An interdigital electrode (210) is mounted on the surface of the graphene nanoribbon composite structure, and the interdigitated electrodes cover multiple protrusions are electrically connected with multiple graphene nanoribbons. USE - Method for preparing FET (claimed) such as junction gate JFET and metal-oxide semiconductor MOSFET. ADVANTAGE - The FET is prepared in large area with low cost and energy consumption. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a FET. DESCRIPTION OF DRAWING(S) - The drawing shows a flow chart of the method for preparing FET. Substrate (16) Graphene nanoribbons (22) Bump (164) Interdigital electrode (210)