▎ 摘　　要

NOVELTY - The method involves forming a graphene layer on the substrate. A metal layer is deposited at desired sections on the graphene layer. A photoresist is coated on the graphene layer and the metal layer is deposited at desired sections on the graphene layer. The photoresist is stripped by removing the graphene layer from the metal deposited sections. The metal is selected from a gold, palladium, copper, nickel and platinum. The metal layer deposited on the graphene layer is in a thickness ranging from about 30nm to 250nm, preferably less than 50 nm. The coating of the photoresist is carried out by drop casting and spin coating. The graphene is deposited in the form of reduced graphene oxide dispersion. USE - Method for patterning of graphene on substrate such as silicon dioxide or silicon substrate (all claimed). ADVANTAGE - The cost is low, simple and effective method for patterning of graphene which is devoid of any negative effect on the graphene that is patterned on a substrate. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of method for patterning of graphene on substrate.