• 专利标题:   Graphene window substrate for use in mobile phone, is prepared by hydrolyzing and drying solution to obtain powder, and immersing, cooling and cleaning silicon carbide slice to obtain graphene mobile phone substrate window.
  • 专利号:   CN105072223-A
  • 发明人:   LEI C, PAN X
  • 专利权人:   CHANGZHOU HAOLI LAI PHOTO ELECTRICITY SC
  • 国际专利分类:   H04M001/02
  • 专利详细信息:   CN105072223-A 18 Nov 2015 H04M-001/02 201601 Pages: 3 English
  • 申请详细信息:   CN105072223-A CN10469908 04 Aug 2015
  • 优先权号:   CN10469908

▎ 摘  要

NOVELTY - A graphene window substrate is prepared by mixing anhydrous ethyl alcohol with diluted hydrochloric acid solution to obtain solution, hydrolyzing and drying the solution to obtain powder, immersing a silicon carbide slice in deionized water, supplying 500W to a microwave machine to perform reaction, placing an aluminum coated silicon carbide slice in a sediment system, cooling the silicon carbide slice, injecting hydrogen ion on a surface of the silicon carbide slice and cleaning the silicon carbide slice to obtain graphene mobile phone substrate window. USE - Graphene window substrate for use in a mobile phone. DETAILED DESCRIPTION - A graphene window substrate is prepared by choosing oxidation graphene, mixing anhydrous ethyl alcohol with diluted hydrochloric acid solution with 1:2 ratio to obtain solution, stirring and hydrolyzing the solution for 20 minutes, filtrating the hydrolyzed solution by performing suction filtrating, placing the filtrated solution in a vacuum drying box, drying and grinding the filtrated solution at 240 degrees C to obtain powder, dissolving the powder in deionized water, immersing a silicon carbide slice in the deionized water, placing the silicon carbide slice immersed deionized water in a 500W microwave machine with 0.1GPa gas pressure and 110 degrees C temperature to perform reaction for 2 hours, supplying 500W to microwave machine to perform reaction for 20 minutes, coating the silicon carbide slice with 1 micron aluminum, placing the aluminum coated silicon carbide slice in a sediment system, introducing acetylene and hydrogen in the sediment system for protecting passing of argon gas into the sediment system, performing reaction for 2 hours at 500 degrees C, removing the silicon carbide slice, cooling the silicon carbide slice at room temperature, injecting hydrogen ion on a surface of the silicon carbide slice to perform polishing and cleaning the silicon carbide slice by the deionized water to obtain a graphene mobile phone substrate window.