• 专利标题:   Graphical graphene doping method involves placing working gas mixture of helium and doping gas into plasma generating device, applying high voltage, and discharging working gas at room temperature with atmospheric pressure plasma.
  • 专利号:   CN103710759-A, CN103710759-B
  • 发明人:   YU Y, WU Y, YE D, LIU L
  • 专利权人:   UNIV HUAZHONG SCI TECHNOLOGY
  • 国际专利分类:   C30B031/20
  • 专利详细信息:   CN103710759-A 09 Apr 2014 C30B-031/20 201435 Pages: 9 Chinese
  • 申请详细信息:   CN103710759-A CN10692748 17 Dec 2013
  • 优先权号:   CN10692748

▎ 摘  要

NOVELTY - A graphical graphene doping method involves placing working gas mixture of helium and doping gas into plasma generating device, applying high voltage, discharging working gas at room temperature with atmospheric pressure plasma, flowing formed plasma by guide tube nozzle export, forming micro-plasma jet, aiming nozzle (7) at graphene thin film specified position, irradiating using microplasma jet (8) for graphene thin film process, doping active atoms of working gas to irradiated area of two-dimensional plane mobile micro-plasma jet or graphene film, and patterning doped graphite. USE - A graphical graphene doping method (claimed). ADVANTAGE - Method is simple, easy, low-cost, and can be effectively incorporated into the skeleton of the impurity atoms on graphene position while not causing damage to graphene original structure. DESCRIPTION OF DRAWING(S) - The drawing shows a structural schematic diagram of micro-plasma jet device. Guide tube (3) Plasma generating means (5) Protective cover (6) Nozzle (7) Micro-plasma jet (8)