• 专利标题:   Solidified abrasive pad used for polishing workpiece e.g. semiconductor, optical crystal, ceramic, metal material and glass, is prepared by uniformly mixing and solidifying wear-reducing radiating agent, dispersant, abrasive grains, and binder.
  • 专利号:   CN113352242-A
  • 发明人:   LI J, WU C, ZHU Y, ZUO D, XIONG G, LI K
  • 专利权人:   UNIV NANJING AERONAUTICS ASTRONAUTICS, WUXI RES INST UNIV NANJING AERONAUTICS
  • 国际专利分类:   B24D003/34, B24D011/00
  • 专利详细信息:   CN113352242-A 07 Sep 2021 B24D-003/34 202184 Pages: 7 Chinese
  • 申请详细信息:   CN113352242-A CN10600820 31 May 2021
  • 优先权号:   CN10600820

▎ 摘  要

NOVELTY - A solidified abrasive polishing pad is prepared by uniformly mixing and solidifying 4-16 wt.% wear-reducing radiating agent, 0.4-4 wt.% dispersant, 30-80 wt.% abrasive grains, and binder. USE - Solidified abrasive pad used for polishing workpiece e.g. semiconductor, optical crystal, ceramic, metal material and glass (all claimed). ADVANTAGE - The solidified abrasive polishing pad achieves friction reduction and heat dissipation without adding liquid polishing media during polishing processing, which solves the problem of large amount of waste of polishing liquid, reduces polishing cost and environmental pollution caused by harmful chemical substances, improves processing efficiency and surface quality of workpieces, and have high utilization rate and increased service life.