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  • 专利标题:   Composition used for forming pattern, comprises graphene derivative including hydrophilic group, and solvent.
  • 专利号:   US2015147701-A1, JP2015102627-A, KR2015059574-A, US9804493-B2, JP6445760-B2
  • 发明人:   KIM H, PARK C H, OKAYASU T, WANG X, PAWLOWSKI G, HAMA Y, KIM H W, WANG X W, XIAOWEI W, GEORG P, YUSUKE H
  • 专利权人:   KIM H, PARK C H, OKAYASU T, WANG X, PAWLOWSKI G, HAMA Y, SAMSUNG ELECTRONICS CO LTD, MERCK PERFORMANCE MATERIALS MFG GK, AZ ELECTRONIC MATERIALS IP JAPAN KK, SAMSUNG ELECTRONICS CO LTD, SAMSUNG ELECTRONICS CO LTD, AZ ELECTRONIC MATERIALS LUXEMBOURG SARL, AZ ELECTRONIC MATERIALS LUXEMBOURG SARL
  • 国际专利分类:   C09D007/12, G03F007/20, G03F007/11, H01L021/027, G03F007/00, C09D005/00, G03F007/09
  • 专利详细信息:   US2015147701-A1 28 May 2015 C09D-007/12 201538 Pages: 9 English
  • 申请详细信息:   US2015147701-A1 US549911 21 Nov 2014
  • 优先权号:   JP242092, KR042023

▎ 摘　　要

NOVELTY - A composition comprises graphene derivative including hydrophilic group, and solvent. USE - Composition is used for forming pattern (claimed) used for manufacturing dynamic random-access memories, flash memories and logic semi-conductor devices. ADVANTAGE - The composition has excellent solubility in alkanes and film-formability, and provides pattern having high resolution and sensitivity, and favorable roughness. The pattern is highly transparent to extreme UV light. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for formation of pattern.