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  • 专利标题:   Manufacturing graphene film used for manufacturing pellicle involves coating graphene with protective film, removing base material by wet etching with etching liquid and dissolving protective film using solvent having lower surface tension.
  • 专利号:   EP3321734-A1, JP2018077412-A, US2018134561-A1, KR2018053251-A, CN108269735-A, US10053367-B2, TW201829310-A
  • 发明人:   YANASE Y, YANASE M, LIANG L
  • 专利权人:   SHINETSU CHEM CO LTD, SHINETSU CHEM IND CO LTD, SHINETSU CHEM CO LTD
  • 国际专利分类:   C01B032/184, G03F001/62, C01B032/15, C01B032/18, C01B032/182, G03F001/64, B05D001/00, B05D003/02, B05D003/10, G03F001/66, G03F007/20, G03F001/82, H01L021/027, B44C001/22, C03C015/00, C03C025/68, C23F001/00, B82Y040/00, B82Y030/00, C01B032/186
  • 专利详细信息:   EP3321734-A1 16 May 2018 G03F-001/62 201835 Pages: 10 English
  • 申请详细信息:   EP3321734-A1 EP198221 25 Oct 2017
  • 优先权号:   JP220221

▎ 摘　　要

NOVELTY - A graphene film is manufactured by preparing film-like graphene (2) provided on base material (1), coating graphene with protective film (3), removing base material by wet etching with etching liquid, and dissolving protective film using solvent having lower surface tension than wet etching liquid (6). USE - Manufacture of graphene film used for manufacturing pellicle (claimed). ADVANTAGE - Breakage and damage of graphene film in manufacturing process can be suppressed. Pellicle frame may be attached to film-like graphene before protective film is completely removed. Pellicle suitable for extreme UV (EUV) exposure can be produced. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacturing pellicle which involves using film-like graphene (2). DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the manufacture of graphene film. Base material (1) Graphene (2) Protective film (3) Adhesive (4, 7) Wet etching liquid (6)