• 专利标题:   Polyamic acid composition, useful for polyimide film that is used in e.g. aerospace industry, comprises graphene oxide.
  • 专利号:   KR2013141168-A, KR1465300-B1
  • 发明人:   PARK S Y, HA H U
  • 专利权人:   UNIV KYUNGPOOK NAT IND ACAD COOP FOUND
  • 国际专利分类:   C01B031/04, C08J005/18, C08K003/04, C08L079/08
  • 专利详细信息:   KR2013141168-A 26 Dec 2013 C08L-079/08 201409 Pages: 14
  • 申请详细信息:   KR2013141168-A KR064364 15 Jun 2012
  • 优先权号:   KR064364

▎ 摘  要

NOVELTY - Polyamic acid composition comprises graphene oxide. USE - The polyamic acid composition is useful for a polyimide film (claimed) that is used in aerospace and electronics industries. ADVANTAGE - The polyamic acid composition increases the electric conductance and mechanical strength of the polyimide film. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparing polyamic acid composition comprising: carrying out oxidation of graphite oxide to graphene; reducing a portion of graphene oxide; and adding reduced graphene oxide to polyamic acid.