• 专利标题:   Preparation method of porous graphene by laser irradiation involves taking polymer microsphere pore-forming agent, controlling laser parameter, directly inducing resin and polymer microsphere mixture to form porous graphene by controlling microsphere size controlling porous structure aperture size.
  • 专利号:   CN115744885-A
  • 发明人:   XU X, LI Z
  • 专利权人:   UNIV FUDAN
  • 国际专利分类:   C01B032/184
  • 专利详细信息:   CN115744885-A 07 Mar 2023 C01B-032/184 202324 Chinese
  • 申请详细信息:   CN115744885-A CN11451148 20 Nov 2022
  • 优先权号:   CN11451148

▎ 摘  要

NOVELTY - Preparation method of porous graphene by laser irradiation involves taking polymer microsphere as pore-forming agent, resin as carbon source of graphene generated by laser induction, controlling laser parameter, directly inducing resin and polymer microsphere mixture to form porous graphene. The polymer microsphere size accurately controlling porous structure aperture size, to improve the specific surface area, adjusting shape and performance of the graphene, combining microporous structure generated by the volatile gas induction in the irradiation process, forming multi-level micro-nano porous structure. USE - Preparation method of porous graphene by laser irradiation. ADVANTAGE - The porous graphene by laser irradiation can be doped with microspheres of different sizes, adjusting aperture size of laser irradiation, controlling graphene micro-nano structure increases porous structure specific surface area. The method is simple, efficient and easy to obtain raw material in price. The obtained product has excellent physical and chemical properties, and it has wide application in industry. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the preparation method laser irradiation.