• 专利标题:   Fine graphene mask for exposure useful in display device, has aperture pitch, aperture gap, graphene pattern made of multi-layered graphene, and dimensional stability layer included on surface of graphene pattern.
  • 专利号:   KR2022073056-A
  • 发明人:   LEE H
  • 专利权人:   LEE H
  • 国际专利分类:   C23C014/04, C23C014/12, H01L051/00, H01L051/56
  • 专利详细信息:   KR2022073056-A 03 Jun 2022 H01L-051/56 202251 Pages: 10
  • 申请详细信息:   KR2022073056-A KR160757 26 Nov 2020
  • 优先权号:   KR160757

▎ 摘  要

NOVELTY - The mask (130) has a graphene pattern (12) made of multi-layered graphene, where the graphene pattern is manufactured by chemical vapor deposition (CVD) process. A dimensionally stability layer (13) is formed on a surface of the graphene. A photosensitive mask is formed with a mask hole on a substrate that is made of metal. The substrate is provided with a metal catalyst layer. The graphene precursor is methane, ethane, propane, butane, ethylene, benzene, ethanol, methanol, isopropane alcohol, anthracene, pyrene, naphthalene, fluoranthene, hexaphenylbenzene, tetraphenylcyclopentadienone, diphenylacetylene, phenylacetane, triptycene, chrysene, triphenylene, coronene, pentacene, corannulene and ovalene. USE - The fine graphene mask is useful in OLED display device. ADVANTAGE - The fine graphene mask has excellent mechanical properties e.g. tensile strength, and can be manufactured in a simple manner. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for manufacturing a fine graphene mask. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating method for manufacturing a fine graphene mask (Drawing includes non-English language text). Graphene patterns (12) Dimensional stability layer (13) Fine graphene mask (130) Micro opening (133)