▎ 摘　　要

NOVELTY - The method involves maintaining the temperature of the substrate below specific range. A source gas of a compound having carbon and hydrogen is flown on the substrate (5). The surface wave plasma of the source gas is generated by microwave excitation to directly form a graphene film on the substrate without using a catalyst. The microwave is a pulse-modulated repetitive pulsed microwave. The substrate is composed of silicon, gallium nitride, copper indium sulfur, glass, and quartz. The carbon dioxide gas other than the source gas is supplied on the substrate. The raw material gas is methane gas. A carbon dioxide gas, hydrogen gas and argon gas are supplied on the substrate. The temperature of the substrate is of specific range. The graphene film is directly formed on the substrate and then treated with ozone. The graphene film is directly formed on the substrate, and is then irradiated with ultraviolet rays in an atmosphere containing oxygen. USE - Method for manufacturing graphene film for coating cantilever used in scanning probe microscope (claimed), by plasma decomposition of a carbon source. ADVANTAGE - The cantilever for a scanning probe microscope with good characteristics is obtained. The method directly form a graphene film having good electrical and optical characteristics and good crystallinity on a substrate. DETAILED DESCRIPTION - The cantilever has probe portion in which a direct film-forming layer made of graphene is coated on a protrusion formed of silicon. DESCRIPTION OF DRAWING(S) - The drawing shows a block diagram of the manufacturing apparatus of the graphene film. (Drawing includes non-English language text) Reaction container (1) Substrate (5) Gas introduction port (11) Discharge port (12) Micro recessed portions (30) Manufacturing apparatus (100)