• 专利标题:   Method for performing optical inspection for graphene using atomic layer deposition, involves forming oxide layer by atomic layer deposition process on metal substrate having graphene layer synthesized on surface.
  • 专利号:   KR2019125667-A
  • 发明人:   KIMHYUNGKEUN, LEE G H
  • 专利权人:   KOREA ELECTRONICS TECHNOLOGY INST
  • 国际专利分类:   G01N025/20, G01N025/72, H01L021/02, H01L021/306
  • 专利详细信息:   KR2019125667-A 07 Nov 2019 G01N-025/72 201989 Pages: 13
  • 申请详细信息:   KR2019125667-A KR049752 30 Apr 2018
  • 优先权号:   KR049752

▎ 摘  要

NOVELTY - The method involves forming an oxide layer by an atomic layer deposition process on a metal substrate having a graphene layer synthesized on a surface, and checking a defect of graphene by heating the metal substrate. USE - Method for performing optical inspection for graphene using atomic layer deposition. ADVANTAGE - The method enables to performing optical inspection for graphene using atomic layer deposition, which effectively evaluates graphene defects and non-uniform number of layers. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for performing graphene nondestructive testing, which involves (A) forming an oxide layer on a metal substrate having a graphene layer synthesized on the surface by an atomic layer deposition process, removing the graphene layer, the multilayer graphene on which the oxide layer is not formed; and (B) visualizing the multilayered graphene removal region from which the multilayered graphene has been removed. DESCRIPTION OF DRAWING(S) - The drawing shows schematic view for a method performing optical inspection for graphene using atomic layer deposition.