▎ 摘　　要

NOVELTY - Graphite and benzene ring-containing monomer having functional group(s) chosen from carboxylic acid group, amide group, sulfonic acid group, carbonylchloride and carbonyl bromide group, are reacted in reaction medium containing polyphosphate and phosphorus pentoxide, to obtain grafted graphene. Grafted graphene is dispersed in organic solvent, to obtain dispersion solution. Obtained dispersion solution is spin-coated on substrate. Resultant substrate is horizontally fitted, and processed, to obtain graphene film. USE - Manufacture of graphene film used for manufacture of patterned graphene film (all claimed). ADVANTAGE - The graphene film having high purity and quality, is manufactured, by simple method. The generation of graphite damage during manufacture of graphene film, is reduced. DETAILED DESCRIPTION - Graphite and organic compound having functional group(s) chosen from carboxylic acid group, amide group, sulfonic acid group, carbonylchloride and carbonyl bromide group are reacted in reaction medium containing polyphosphate and phosphorus pentoxide, to obtain organically functionalized graphene. Graphite and benzene ring-containing monomer having functional group(s) chosen from carboxylic acid group, amide group, sulfonic acid group, carbonylchloride and carbonyl bromide group, are reacted in reaction medium containing poly phosphate and phosphorus pentoxide, to obtain grafted graphene. Obtained organically functionalized graphene or grafted graphene is dispersed in organic solvent, to obtain dispersion solution (0.001-100 mg/ml). Obtained dispersion solution is dispersed or spin-coated on substrate. Resultant substrate is horizontally fitted, and processed for 0.01 second to 5 minutes, to obtain graphene film. An INDEPENDENT CLAIM is included for manufacture of patterned graphene film.