▎ 摘　　要

NOVELTY - Mechanism comprises a moveable arm; and a motor (307) configured to actuate the movable arm. The moveable arms comprise an actuating member (304) connected to the motor and configured to move the movably arm between a retracted state and an extended state. The movable arms are configured to operate in a chamber having a first pressure and a first temperature. The motor is located outside the chamber in an environment having a second pressure. The first temperature is set such that graphene deposition can be performed on a substrate. The moveable arm comprises at least one of stainless steel alloy, titanium alloy and bronze. The cylindrical housing may comprise at least one of quartz and graphite. The first coating may comprise at least one of graphite, carbon, tungsten nitride, molybdenum nitride, tantalum nitride, titanium nitride, silicon nitride, and/or silicon carbide. USE - The mechanism is useful for moving a substrate carrier through a chemical vapor deposition system (claimed) for depositing a thin film of a desired material onto a substrate for technical applications. ADVANTAGE - The mechanism: allows the substrate carrier to be moved through the chemical vapor deposition system in an efficient and effective manner; ensures that the first temperature is set so that graphene deposition can be performed on a substrate in the system in a reliable manner; serves to reduce the amount of floor space taken up by the chemical vapor deposition system; and is cost-effective. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a substrate carrier for moving many substrates through a chemical vapor deposition system. DESCRIPTION OF DRAWING(S) - The figure shows a front view of a fixed end. 304Actuating member 306First support beam 307Motor 310First support rod 312Second support rod