• 专利标题:   Preparing biological sensor based on chemical resistance for construction site, involves using standard photoetching technology to print electrode on substrate, using electron beam evaporation deposition, chromium/gold and silicon.
  • 专利号:   CN113588742-A
  • 发明人:   NI M, WANG Y, WANG J, YU W
  • 专利权人:   CHINA MCC17 GROUP CO LTD
  • 国际专利分类:   G01N027/30, G01N027/327
  • 专利详细信息:   CN113588742-A 02 Nov 2021 G01N-027/30 202225 Chinese
  • 申请详细信息:   CN113588742-A CN10598531 31 May 2021
  • 优先权号:   CN10598531

▎ 摘  要

NOVELTY - Preparing biological sensor based on chemical resistance involves using standard photoetching technology to print the electrode on the substrate, using electron beam evaporation deposition 20 nanometer/180 nanometer chromium/gold, silicon/silicon oxide electrode cleaning, the exposed silicon/silicon oxide electrode by acetone ultrasonic pre-treatment and nitrogen cleaning, the silicon oxide surface is hydrophilic. The reduction-oxidation graphene electrode is non-covalently functionalized with sugar through connecting molecule. The rGO device is modified by conA lectin to follow the rGO device functionalization program. USE - Method for preparing biological sensor based on chemical resistance used for construction site (claimed), where the biological sensor is useful in the field of water environment detection. ADVANTAGE - The method is fast, simple, reliable, and has strong sensitivity. The method can distinguish bacteria and virus infection and has the ability to sequence the antibiotic according to curative effect.