• 专利标题:   Method for gradually thinning graphene to obtain graphene nano structure, involves removing top layer of multilayer graphene by anisotropy oxidation process, annealing and processing multi-plasma treatment and high temperature annealing.
  • 专利号:   CN102344132-A, CN102344132-B
  • 发明人:   DING G, JIANG M, XIE X, YANG X
  • 专利权人:   CHINESE ACAD SCI SHANGHAI INST MICROSYST, CHINESE ACAD SCI SHANGHAI MICROSYSTEMS
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN102344132-A 08 Feb 2012 C01B-031/04 201236 Pages: 10 Chinese
  • 申请详细信息:   CN102344132-A CN10191536 08 Jul 2011
  • 优先权号:   CN10191536

▎ 摘  要

NOVELTY - A gradually thinning graphene method involves removing a top layer of a multilayer graphene alkene in oxygen plasma environment by anisotropy of oxidation process using plasma ashing technology and followed by low temperature annealing. The obtained layered graphene is thinned by multi-plasma treatment with high temperature annealing to get thin layer graphene. USE - Method for gradually thinning graphene to obtain graphene nano structure using graphene electronic apparatus. ADVANTAGE - The method enables gradually thinning graphene in an efficient manner.