• 专利标题:   Pellicle used for exposure to extreme UV rays, comprises substrate having opening formed in central portion, etch stop layer formed on substrate to cover opening, and nanoporous graphene layer in which nanopores are formed on graphene layer, provided on etch stop layer.
  • 专利号:   KR2023058781-A
  • 发明人:   KIMHYUNGKEUN, MI K H, KIM S K, JOJINWOO, KIM H Y
  • 专利权人:   KOREA ELECTRONICS TECHNOLOGY INST
  • 国际专利分类:   C01B032/182, G03F001/22, G03F001/62
  • 专利详细信息:   KR2023058781-A 03 May 2023 G03F-001/62 202348 Pages: 20
  • 申请详细信息:   KR2023058781-A KR142409 25 Oct 2021
  • 优先权号:   KR142409

▎ 摘  要

NOVELTY - A pellicle (100) comprises a substrate (10) having an opening (13) formed in a central portion, an etch stop layer (20) formed on the substrate to cover the opening, and a nanoporous graphene layer (30) in which nanopores (33) are formed on the graphene layer (31), provided on the etch stop layer. USE - Pellicle is used for exposure to extreme UV rays. ADVANTAGE - The pellicle comprises the nanoporous graphene layer which is capable of improving extreme UV transmittance to 90% or more compared to the same thickness of the graphene layer. The extreme UV transmittance is controlled to be 90% or more by adjusting the shape, size, and pitch of the nanopores formed in the graphene layer. The metal layer used to form the nanopores in the graphene layer has the advantage of being processed into a thin film after forming the nanopores in the graphene layer to be used as a thermal radiation layer. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacture of the pellicle, which involves forming the etch stop layer on the substrate, forming the graphene layer on the etch stop layer, and forming nanopores in the graphene layer to form nanoporous graphene layer. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the pellicle. 10Substrate 13Opening 20Etch stop layer 30Nanoporous graphene layer 31Graphene layer 33Nanopores 100Pellicle