• 专利标题:   Composition used in electro-thermal coatings comprises polymer matrix, nanostructure mixture evenly mixed into polymer matrix nanostructure mixture having low-dimensional nanostructures and nanostructure mixture.
  • 专利号:   US2021083163-A1
  • 发明人:   CONNER A
  • 专利权人:   ENDEAVOUR GROUP INC
  • 国际专利分类:   C09D011/037, C09D011/322, C09D005/24, C09D005/26, C09D007/40, H01L035/10, H01L035/26, H01L035/34
  • 专利详细信息:   US2021083163-A1 18 Mar 2021 H01L-035/26 202138 English
  • 申请详细信息:   US2021083163-A1 US570829 13 Sep 2019
  • 优先权号:   US570829

▎ 摘  要

NOVELTY - Composition comprises: a polymer matrix; and a nanostructure mixture evenly mixed into the polymer matrix the nanostructure mixture comprising at least two low-dimensional nanostructures where at least one of the two low-dimensional nanostructures is above the percolation limit and at least one nanostructure mixture is below the percolation limit of each of the at least two low-dimensional nanostructures within the polymer matrix when the composition is cured. USE - The composition is useful for electro-thermal coatings (claimed). ADVANTAGE - The composition: provides improved electricrothermal material that generates heat from nano structures formed in polymer matrix; and provides significant improvements in composite mechanical strength (owing to the CNTs mechanical strength) making them suitable candidates for novel polymer composites and physical properties and performance of polymer matrix in nanocomposites can be improved by adding small percentages of CNTs. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: (a) composition comprising polymer matrix and nanostructure mixture mixed into the polymer matrix the nanostructure mixture comprising at least two low-dimensional nanostructures where the nanostructure mixture is below the percolation limit of each of the at least two low-dimensional nanostructures within the polymer matrix when the composition is cured, where the quantity of nanostructures within the polymer matrix can vary based on the type of nanostructures in the ET coating and the desired use. While the percolation limit can vary, percolation limits from 8-25 wt.% can be achieved for mixtures of graphene and polysiloxane; and (b) preparing the composition comprising providing a polymer matrix, providing a nanostructure mixture mixed into the polymer matrix the nanostructure mixture comprising at least two low-dimensional nanostructures where the nanostructure mixture is below the percolation limit of each of the at least two low-dimensional nanostructures within the polymer matrix when the composition is cured, where the percolation limit concentration of the low dimensional carbon nanostructure-polymer composite can be reduced to below the statistical percolation limit by preparing the nanostructure filler as a random mixture of 0D with any of 1D and 2D nanostructures, and the concentration of the mixed nanostructures within the cured polymer composite coating is below the percolation limit of each individual carbon nanostructure type, alone, within an identical polymer matrix.