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  • 专利标题:   Manufacturing graphene film involves providing substrate, distributing graphene slurry on substrate, causing graphene slurry to distribute on substrate, and treating graphene slurry with atmosphere pressure plasma jet.
  • 专利号:   US2015315026-A1, TW201540662-A, TW535653-B1, US9908779-B2
  • 发明人:   CHENG I, CHEN J, HSU C, CHOU P, LIU H, CHANG H, LIANG S, WU T, CHENG I C, CHEN J Z, HSU C C, CHOU P T, LIU H W, LIANG S P, WU T J
  • 专利权人:   CHENG I, CHEN J, HSU C, CHOU P, LIU H, CHANG H, LIANG S, WU T, UNIV TAIWAN NAT, UNIV TAIWAN NAT
  • 国际专利分类:   C01B031/04, C23C004/04, C23C004/12, C01B031/02, B05D003/06, C23C018/12, C23C018/14, C23C004/134, H01J037/32
  • 专利详细信息:   US2015315026-A1 05 Nov 2015 C01B-031/04 201578 Pages: 16 English
  • 申请详细信息:   US2015315026-A1 US701471 30 Apr 2015
  • 优先权号:   TW115622

▎ 摘　　要

NOVELTY - Graphene film is manufactured which involves providing a substrate; distributing a graphene slurry on the substrate; causing the graphene slurry to distribute on the substrate; and treating the graphene slurry distributed on the substrate with an atmosphere pressure plasma jet (APPJ) to form the graphene film. USE - The methods are useful for manufacturing graphene film, and three-dimensional graphene foam (all claimed). ADVANTAGE - After the treatment, the initial graphene material will be transformed into a graphene film with a special structure and characteristic. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for: (1) a method for manufacturing a three-dimensional graphene foam which involves providing a graphene slurry; and treating the graphene slurry with APPJ to form the three-dimensional graphene foam; and (2) a system for manufacturing a graphene film, comprising: a substrate having graphene slurry disposed on it; and APPJ treating the graphene slurry to form the graphene film on the substrate.