• 专利标题:   Device useful for preparing graphene by silicon carbide epitaxial growth, has air inlet device, reaction device and tail gas processing device, where air inlet device comprises air inlet pipe, gas flow controller and control valve.
  • 专利号:   CN107673334-A, CN207845164-U
  • 发明人:   LIU X, WEI X, WEI Z
  • 专利权人:   CHENGDU GELAIFEI TECHNOLOGY CO LTD
  • 国际专利分类:   C01B032/188
  • 专利详细信息:   CN107673334-A 09 Feb 2018 C01B-032/188 201820 Pages: 6 Chinese
  • 申请详细信息:   CN107673334-A CN11032358 29 Oct 2017
  • 优先权号:   CN11032358, CN21411338

▎ 摘  要

NOVELTY - A device has an air inlet device, a reaction device and a tail gas processing device. The air inlet device comprises an air inlet pipe, a gas flow controller and a control valve. The reaction device comprises copper pipe (A) arranged on induction coil (A). The induction coil (A) is connected with a high-frequency induction heating device, nickel-iron-chromium alloy trays and metal porous plates. The bottom portion and top portion of the reaction device are respectively provided with air inlets and air outlets. USE - The device is useful for preparing graphene by silicon carbide epitaxial growth. ADVANTAGE - The device is environmentally-friendly. DETAILED DESCRIPTION - A device has an air inlet device, a reaction device and a tail gas processing device. The air inlet device comprises an air inlet pipe, a gas flow controller and a control valve. The reaction device comprises copper pipe (A) arranged on induction coil (A). The induction coil (A) is connected with a high-frequency induction heating device, nickel-iron-chromium alloy trays and metal porous plates. The bottom portion and top portion of the reaction device are respectively provided with air inlets and air outlets. The left side of the reaction device is provided with an air pumping valve and a distal mechanical pump. The reaction device of air outlet is provided with a molecular pump. The tail gas treatment device comprises a hydrogen flow controller, a heating chamber and a storage chamber.