▎ 摘　　要

NOVELTY - Multilayer thin film comprises a graphene layer (120); a first barrier layer (130) which heals defect of the graphene layer positioned on the graphene layer; a conductive layer (140) located on the first barrier layer; and a second barrier layer (150) located on the conductive layer. USE - The multilayer thin film is useful in optical device. ADVANTAGE - The multilayer thin film has excellent barrier performance and mechanical flexibility, exhibits excellent conductivity and flexibility while inducing light scattering on surface when used in optical device, and increases optical efficiency of optical device. The method provides multilayer thin film by preventing defects in the graphene layer. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for producing multilayer thin film comprising either: (a) forming graphene layer on metal substrate (110) by chemical vapor deposition, (b) forming the first barrier layer on the graphene layer by atomic layer deposition process, (c) forming the conductive layer on the first barrier layer by sputtering process, and (d) forming the second barrier layer on the conductive layer; or (a1) forming irregularities on the metal substrate, (b1) forming the graphene layer on metal substrate by chemical vapor deposition, (c1) forming the first barrier layer on the graphene layer by atomic layer deposition process, (d1) forming the conductive layer on the first barrier layer by sputtering process, and (e1) forming the second barrier layer on the conductive layer. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the multilayer thin film. Metal substrate (110) Graphene layer (120) First barrier layer (130) Conductive layer (140) Second barrier layer (150)