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  • 专利标题:   Manufacture of graphene quantum dots used for road stickers, road signs, coatings, clothing, paints and photographic processing materials, involves exposing carbon source chosen from coal and coke to oxidant.
  • 专利号:   WO2014179708-A1, KR2016003231-A, SG11201509011-A1, CN105339301-A, US2016060122-A1, EP2991929-A1, JP2016525997-W, EP2991929-A4, HK1222634-A0, US9919927-B2
  • 发明人:   TOUR J M, YE R, XIANG C, LIN J, PENG Z, HAYASHI K, CERIOTTI G
  • 专利权人:   UNIV RICE WILLIAM MARSH, UNIV RICE WILLIAM
  • 国际专利分类:   C01B031/04, C09K011/65, B82Y040/00, C01B031/02, C01B000/00, C01B032/182, C01B032/184, C01B032/192, C01B032/194
  • 专利详细信息:   WO2014179708-A1 06 Nov 2014 C01B-031/04 201475 Pages: 62 English
  • 申请详细信息:   WO2014179708-A1 WOUS036604 02 May 2014
  • 优先权号:   US818800P, WOUS036604, US14888301

▎ 摘　　要

NOVELTY - A carbon source chosen from coal and coke is exposed (12) to an oxidant, to form (14) graphene quantum dots. USE - Manufacture of graphene quantum dots used for road stickers, road signs, coatings, clothing, paints and photographic processing materials (all claimed). ADVANTAGE - The method enables manufacture of graphene quantum dots having reduced surface impurities, with excellent quantum yield. DESCRIPTION OF DRAWING(S) - The drawing shows schematic view explaining manufacture of graphene quantum dots. Exposure of carbon source (12) Formation of quantum dots (14) Separation of quantum dots (16) Enhancement of quantum yield of quantum dots (18) Reduction of quantum dots (20)