• 专利标题:   Producing multi-layered block copolymer thin film, comprises e.g. forming first oxide graphene monolayer film on at least one side of substrate, and forming first block copolymer thin film layer on first oxide graphene single layer film.
  • 专利号:   KR2018036215-A, KR1960334-B1
  • 发明人:   KOO J S, CHOI K I, KIM T H
  • 专利权人:   KOREA ATOMIC ENERGY RES INST
  • 国际专利分类:   B32B027/06, B32B037/06, B32B009/00, C08J005/18, C08L025/08
  • 专利详细信息:   KR2018036215-A 09 Apr 2018 B32B-027/06 201833 Pages: 22
  • 申请详细信息:   KR2018036215-A KR126539 30 Sep 2016
  • 优先权号:   KR126539

▎ 摘  要

NOVELTY - Producing multi-layered block copolymer thin film, comprises e.g. (i) forming first oxide graphene monolayer film on at least one side of substrate, (ii) forming first block copolymer thin film layer including polar block and nonpolar block on first oxide graphene single layer film, (iii) performing annealing by heating first block copolymer thin film layer for vertically oriented self-assembly of block copolymer nanostructure of thin film layer based on horizontal plane of first oxide graphene single layer film, and (iv) forming second oxidized graphene monolayer film. USE - The method is useful for producing multi-layered block copolymer thin film. ADVANTAGE - The method induces regular vertical alignment of the nanometer size of the block copolymer by a simple process without complicated pretreatment process. DETAILED DESCRIPTION - Producing multi-layered block copolymer thin film, comprises either: (i) forming a first oxide graphene monolayer film having amphipathic property on at least one side of a substrate using the Langmuir method, (ii) forming a first block copolymer thin film layer including a polar block and a nonpolar block on the first oxide graphene single layer film, (iii) performing annealing by heating the first block copolymer thin film layer for vertically oriented self-assembly of the block copolymer nanostructure of the thin film layer based on a horizontal plane of the first oxide graphene single layer film, (iv) forming a second oxidized graphene monolayer film having amphipathic property on the first block copolymer thin film layer using the Langmuir method, (v) forming a second block copolymer thin film layer including a polar block and a nonpolar block on the second oxide graphene single layer film, and (vi) performing annealing by heating the second block copolymer thin film layer for vertically oriented self-assembly of the block copolymer of the second block copolymer thin film layer based on a horizontal plane of the nano-structured second oxide graphene monolayer film; or (a) forming a first oxide graphene monolayer film having amphipathic property on at least one side of the substrate using the Langmuir method, (b) forming a first block copolymer thin film layer including a polar block and a nonpolar block on the first oxide graphene single layer film, (c) forming a second oxidized graphene monolayer film having amphipathic property using the Langmuir method on the first block copolymer thin film layer, (d) forming a second block copolymer thin film layer including a polar block and a nonpolar block on the second oxide graphene single layer film, and (e) performing annealing by heating the first and second block copolymer thin film layers for vertically oriented self-assembly of the block copolymer nano-structures of the first and second block copolymer thin film layers based on horizontal plane of the first and second oxide graphene monolayer films. An INDEPENDENT CLAIM is also included for multi-layered block copolymer thin film comprising a substrate, a first oxide graphene monolayer film formed on at least one surface of the substrate, a first group including a first block copolymer thin film layer in which a block copolymer nanostructure is vertically oriented based on horizontal plane of the first graphene single layer film, located on the first oxide graphene single layer film, a second oxide graphene monolayer film formed on the first group and having amphipathic nature, and a second group comprising a second block copolymer thin film layer in which a block copolymer nanostructure is vertically oriented based on a horizontal plane of the second graphene graphene single layer film.