▎ 摘　　要

NOVELTY - In situ preparation of electroless graphene thin film, comprises (a) forming a titanium catalyst layer having thickness of 10-20 nm by sputtering on a substrate for synthetic resin material or a substrate for a transparent electrode, (b) performing In-situ plasma assisted chemical vapor deposition on the substrate in which the titanium catalyst layer is formed, in the same equipment as the sputtering equipment, and growing a graphene thin film in the substrate for the element or the transparent electrode is not deformed, at a temperature. USE - The film is useful to produce graphene-based electroless electroluminescent device (claimed) and flexible electronic device. ADVANTAGE - The method does not change transparency and electric characteristics of base substrate. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for producing graphene-based electroless electroluminescent device, comprising (i) forming a titanium catalyst layer on the substrate for a device made of synthetic resin by sputtering process, and (ii) performing In-situ plasma assisted chemical vapor deposition on the substrate in which the titanium catalyst layer is formed, in the same equipment as the sputtering equipment, and growing a graphene thin film at a temperature in which the substrate for an element is not deformed.