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  • 专利标题:   Graphene growth substrate composite etching liquid comprises surfactant, defoamer and cosolvent.
  • 专利号:   CN104118871-A, CN104118871-B
  • 发明人:   WANG W
  • 专利权人:   WUXI GEFEI ELECTRONIC THIN FILMS TECHNOL, WUXI GRAPHENE FILM CO LTD
  • 国际专利分类:   C01B031/04, C09K013/00, C23F001/14, C23F001/18, C23F001/28
  • 专利详细信息:   CN104118871-A 29 Oct 2014 C01B-031/04 201504 Pages: 9 Chinese
  • 申请详细信息:   CN104118871-A CN10372705 31 Jul 2014
  • 优先权号:   CN10372705

▎ 摘　　要

NOVELTY - Graphene growth substrate composite etching liquid comprises 0.0001-10 pts. wt. surfactant, 0-10 pts. wt. defoamer and 0-10 pts. wt. cosolvent. USE - Graphene growth substrate composite etching liquid. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the etching method comprising coating substrate with transfer medium, applying etching liquid, rinsing and cleaning.