• 专利标题:   Method for direct optical visualization of graphene and nanoscale defects, involves preparing sample having graphene on transparent substrate, overlaying sample with liquid medium, and imaging sample using interference reflection microscopy.
  • 专利号:   WO2018005431-A1, US2019219519-A1
  • 发明人:   LI W, MOON S, WOJCIK M, XU K
  • 专利权人:   UNIV CALIFORNIA, UNIV CALIFORNIA
  • 国际专利分类:   B82Y030/00, B82Y040/00, G01N013/00, G01N021/00, G01N033/00, G02B021/00, G01N021/892, G01N021/45, G01N021/84, G02B021/32
  • 专利详细信息:   WO2018005431-A1 04 Jan 2018 B82Y-040/00 201806 Pages: 74 English
  • 申请详细信息:   WO2018005431-A1 WOUS039411 27 Jun 2017
  • 优先权号:   US355327P, US16312990

▎ 摘  要

NOVELTY - The method involves preparing a sample having graphene on a transparent substrate. The sample is overlaid with a liquid medium. The sample is imaged using interference reflection microscopy. The sample is prepared by transferring the layers of graphene to a transparent substrate using a wet-transfer process with polymethyl methacrylate protection. The sample is prepared by transferring the layers of graphene to a transparent substrate using a dry-transfer process using thermal release tape. USE - Method for the direct optical visualization of graphene and the nanoscale defects. ADVANTAGE - The real-time inspection of nanoscale defects is readily achieved over large areas. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a measurement system.