▎ 摘　　要

NOVELTY - The method involves patterning a substrate (102) to form a set of elements (104-3) on a surface (202) of the substrate. First and second graphene layers (302-3) are generated on entire first surface (204-3) of the element and entire second surface of a trench, respectively, where the second graphene layer has thickness that is less than difference in first elevation and second elevation for creating a graphite-based structure in which the second graphene layer is isolated from the first graphene layer, and the first and second graphene layers comprise graphene sheets. USE - Method for forming a graphite-based structure on a substrate. Uses include but are not limited to graphene quantum dots, graphene nanoribbons, graphene nanonetworks, graphene plasmonics and graphene super-lattices. ADVANTAGE - The method enables reducing or eliminating loss of surface areas occurring during isolation of graphene layers after graphene generation, thus improving functionalities or efficiency of the generated graphite structures or devices. The method enables reducing standing waves, thin-film interference and specular reflections, thus improving pattern resolution, while rendering an image accurately without any visible distortion or information loss. DESCRIPTION OF DRAWING(S) - The drawing shows a cross sectional view illustrating a topography of a graphene device. Substrate (102) Elements (104-3) Surface of substrate (202) Surface of element (204-3) Graphene layer (302-3)