• 专利标题:   Manufacture of material having organically-modified carbon surface e.g. carbon nanotubes, involves surface-oxidizing carbon surface of material and organically-modifying oxidized surface with organic compound containing functional group(s).
  • 专利号:   JP2021028292-A, JP7158756-B2
  • 发明人:   AJIRI M
  • 专利权人:   SUPER NANO DESIGN KK, SUPER NANO DESIGN CO LTD
  • 国际专利分类:   C01B032/174, C01B032/194, C01B032/28, C01B032/05, C01B032/168
  • 专利详细信息:   JP2021028292-A 25 Feb 2021 C01B-032/174 202121 Pages: 27 Japanese
  • 申请详细信息:   JP2021028292-A JP196443 27 Nov 2020
  • 优先权号:   JP208345, JP196443

▎ 摘  要

NOVELTY - Manufacture of material having an organically-modified carbon surface involves surface-oxidizing a carbon surface of a material with an oxidizing agent using subcritical water, supercritical water, or a supercritical organic solvent as a reaction zone, removing or diluting the solvent and oxidizing agent from the surface-oxidized material, adding an organic compound comprising functional group(s) (excluding silicon compound) and a solvent, and organically-modifying the oxidized surface with the organic compound using subcritical water, supercritical water, or a supercritical organic solvent as a reaction zone. USE - Manufacture of material having organically-modified carbon surface. Uses include but are not limited to carbon nanotubes, fullerene, graphene, carbon black, nanodiamond, and carbon fibers. ADVANTAGE - The method can uniformly organically-modify carbon surface of the material. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for material with the organically-modified carbon surface, which has the carbon surface organically modifying with the organic compound (excluding silicon compound) by ether bond, ester bond, bond through nitrogen atom including amino bond or amide bond, bond through sulfur atom, bond through phosphorus atom, phosphate ester bond, phosphite bond, phosphonic acid bond, subphosphonic acid bond, phosphinic acid bond, or subphosphinic acid bond. The content of molecule which organically modifies the carbon surface is 2 wt.% or more.