▎ 摘　　要

NOVELTY - The method involves coating photosensitive resin on a graphene thin film surface and forming a protection layer, where the photosensitive resin is epoxy resin and acrylic resin. A protection layer area is exposed according to pattern shape. An unbound exposure area is removed by developing liquid according to the protection layer. The graphene thin film surface is formed with an etching part that is placed in plasma atmosphere to form graphic shape. The protection layer is formed in liquid leaching process and transferred to a substrate. USE - Graphene thin film patterning method for a function device of a flexible solar energy battery (all claimed). ADVANTAGE - The method enables realizing orientation for cutting graphene with high patterning precision, avoiding image edge rough problem and preventing single plasma etching defect, and ensures more convenience. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for the following: (1) a function device (2) a flexible solar energy battery. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a graphene thin film patterning method.'(Drawing includes non-English language text)'