▎ 摘　　要

NOVELTY - The adsorption-photocatalytic degradation combined method for treatment of organic dye wastewater, involves mixing graphite oxide dispersion and pretreated porous carbon spheres, placing the high-purity iron sheet in deionized water, carrying out cyclic voltammetry deposition and reduction of graphene sheets onto alpha -ferric oxide nanotube array substrates, depositing cuprous nanoparticles onto the surface of graphene/ alpha -ferric oxide nanotube array substrate, adding cuprous oxide/graphene/ alpha -ferric oxide nanotube array composite, degrading and stirring the product. USE - Adsorption-photocatalytic degradation combined method for treatment of organic dye wastewater. ADVANTAGE - The adsorption-photocatalytic degradation combined method enables treatment of organic dye wastewater with high decoloration rate and high chemical oxygen demand removal rate. DETAILED DESCRIPTION - Adsorption-photocatalytic degradation combined method for treatment of organic dye wastewater, involves (1) adding graphite oxide to deionized water, ultrasonically processing at 500 W for 1 hour to obtain graphite oxide dispersion, (2) placing the porous carbon spheres in solution of anhydrous ethanol and cetyltrimethylammonium bromide, stirring at 30-40 degrees C for 30-70 minutes, filtering, vacuum drying the resulting solid to obtain pretreated porous carbon spheres, (3) mixing graphite oxide dispersion and pretreated porous carbon spheres, transferring to three-necked flask, slowly heating at 80-90 degrees C, reflowing at 3000 rpm for 5 hours, cooling to room temperature, centrifuging, drying the precipitate to obtain composite adsorbent, (4) polishing the high-purity iron sheet, washing with absolute ethanol and distilled water, drying, using high-purity iron sheet as anode, platinum as cathode, and ethanol solution-containing fluoride and deionized water as electrolyte, carrying out anodizing reaction (I) by placing the anode in deionized water, ultrasonically processing to remove nanoporous oxide layer, carrying out anodizing reaction (II), cleaning with deionized water, drying, placing in a muffle furnace, treating under oxygen atmosphere, cooling the furnace to room temperature to obtain alpha -ferric oxide nanotube arrays, (5) using alpha -ferric oxide nanotube arrays as working electrode, platinum plate as counter electrode, and saturated calomel electrode as reference electrode, carrying out cyclic voltammetry deposition and reduction of graphene sheets onto alpha -ferric oxide nanotube array substrates, washing with deionized water, introducing nitrogen to prepare graphene/ alpha -ferric oxide nanotube arrays, (6) using graphene/ alpha -ferric oxide nanotube arrays as working electrode, platinum plate as counter electrode and saturated calomel electrode as reference electrode, adding copper salt aqueous solution containing 1-ethyl-3-methylimidazolium ethanesulfonate, depositing cuprous nanoparticles onto the surface of graphene/ alpha -ferric oxide nanotube array substrate by constant voltage method, washing with deionized water and drying with nitrogen to prepare cuprous oxide/graphene/ alpha -ferric oxide nanotube array composites, (7) initially precipitating organic dye waste water through the grid, pumping the supernatant into the adsorption treatment tank containing the composite adsorbent, stirring at 30 degrees C for 1-3 hours, leaving still, pumping the precipitated supernatant into reactor, (8) adding cuprous oxide/graphene/ alpha -ferric oxide nanotube array composite as a catalyst to reactor, pumping air, degrading under light conditions for 10-16 hours, stirring in the dark for 4-6 hours, finally settling the supernatant according to emission standards. The anodizing reaction (I) and anodizing reaction (II) are maintained at 30-60 V and 10-25 degrees C for 1-10 minutes. The muffle furnace is maintained at 200-500 degrees C for 1-2.5 hours. The cyclic voltammetry deposition and reduction process is carried out at -1.5-1.0 V, scanning rate of 30-60 mV/ampere and scanning deposition cycles of 2-20 cycles. The constant voltage deposition process is carried out at -0.15-(-0.3) V for 500-4000 seconds.