• 专利标题:   Graphene micro-opto-electro-mechanical system accelerometer for use electronic products, has bottom substrate layer, oxide buried layer deposited on bottom substrate layer, and device structure layer deposited on oxide buried layer, the device structure layer with different shapes of hole structure.
  • 专利号:   CN115166297-A
  • 发明人:   ZHAO L, YANG X, XIA D
  • 专利权人:   UNIV SOUTHEAST
  • 国际专利分类:   G01P015/03
  • 专利详细信息:   CN115166297-A 11 Oct 2022 G01P-015/03 202286 Chinese
  • 申请详细信息:   CN115166297-A CN10157198 21 Feb 2022
  • 优先权号:   CN10157198

▎ 摘  要

NOVELTY - Graphene micro-opto-electro-mechanical system accelerometer based on graphene has bottom substrate layer, an oxide buried layer deposited on the bottom substrate layer, and a device structure layer deposited on the oxide buried layer, the device structure layer comprises a supporting frame and a mass block (1-1) in the middle position of the supporting frame, the left and right sides of the mass block are respectively connected with the supporting frame through the cantilever beam spring (1-3), the upper end and the lower end of the middle part of the longitudinal direction of the mass block are respectively protruded outwards to form a mass block sensing area, the mass sensing area is periodically paved with a graphene strip (1-6) to form a sensitive unit (1-2), the upper and lower ends of the supporting frame are symmetrically provided with an optical waveguide (1-4) at the left and right sides of the sensitive unit. USE - Graphene micro-opto-electro-mechanical system accelerometer for use in consumer electronic products. ADVANTAGE - The graphene micro-opto-electro-mechanical system accelerometer has simple structure, light weight, clear processing technology and low cost. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a processing method based on graphene micro-opto-electro-mechanical system accelerometer, which involves: i. drying the bottom substrate layer surface, and depositing a layer of oxide buried layer on the bottom substrate layer surface by using low pressure chemical vapor deposition further depositing a layer of device layer on the surface of the oxide buried layer, then through gluing, exposure, developing, etching, removing the glue process sequentially form optical waveguide and mass block sensing area structure, mass block, cantilever spring beam and supporting frame structure; and ii. manufacturing the graphene strip and transferring the prepared graphene strip to the mass block sensing area; at last, cleaning and drying. DESCRIPTION OF DRAWING(S) - The drawing shows a three-dimensional structure exploded view of the graphene micro-opto-electro-mechanical system accelerometer. 1-1Mass block 1-3Cantilever spring beam 1-6Graphene strip 1-2Sensitive unit 1-4Optical waveguide