• 专利标题:   Method for manufacturing saw filter by applying soft lithography patterning using CVD graphene, involves separating adhered wafer and stamp mold, and attaching separated stamp mold to piezo substrate to form pattern on substrate.
  • 专利号:   KR2019107391-A
  • 发明人:   LEE J H
  • 专利权人:   ESAN GLOBAL CO LTD
  • 国际专利分类:   G03F007/00, H01L021/027, H01L021/78, H03H003/08
  • 专利详细信息:   KR2019107391-A 20 Sep 2019 H03H-003/08 201986 Pages: 7
  • 申请详细信息:   KR2019107391-A KR028596 12 Mar 2018
  • 优先权号:   KR028596

▎ 摘  要

NOVELTY - The method involves bonding (110) a wafer with a graphene layer. The graphene layer is formed with a patterned polydimethylsiloxane stamp mold. The adhered wafer and the polydimethylsiloxane stamp mold are separated (120). The separated polydimethylsiloxane stamp mold is attached to a piezo substrate to form a pattern on the piezo substrate. USE - Method for manufacturing a saw filter by applying soft lithography patterning using CVD graphene. ADVANTAGE - The method enables simplify manufacturing a saw filter by forming a high resolution pattern. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating a method for manufacturing a saw filter by applying soft lithography patterning using CVD graphene. '(Drawing includes non-English language text)' Step for bonding wafer with graphene layer (110) Step for separating adhered wafer and polydimethylsiloxane stamp mold (120)