• 专利标题:   Structure e.g. porous metal-coated structure used for e.g. catalytic application, comprises substrate comprising activated adsorbent material, and metal material deposited on substrate.
  • 专利号:   WO2021248069-A1, US2021381103-A1, KR2023022430-A, CA3181437-A1, EP4162097-A1, BR112022024821-A2, CN116157201-A, JP2023528480-W
  • 发明人:   PEPIN P, ETHRIDGE K, THOMSON C, HOLBROOK B, ESRIDGE K
  • 专利权人:   INGEVITY SOUTH CAROLINA LLC, INGEVITY SOUTH CAROLINA LLC, INGEVITY SOUTH CAROLINA LLC
  • 国际专利分类:   C23C016/455, B01J023/44, C23C016/18, C23C016/44, B01J020/282, B01J020/32, B01J020/20, B01J020/28, C23C016/04, C23C016/40, B01J021/18, B01J035/10, B01J037/02, C01B032/354
  • 专利详细信息:   WO2021248069-A1 09 Dec 2021 C23C-016/455 202201 Pages: 63 English
  • 申请详细信息:   WO2021248069-A1 WOUS036004 04 Jun 2021
  • 优先权号:   US035224P, US339634, BR11024821, CA3181437, KR700460, CN80056935

▎ 摘  要

NOVELTY - A structure comprises a substrate comprising an activated adsorbent material, and a metal material deposited on the substrate. USE - Structure e.g. porous metal-coated structure. Uses include but are not limited to catalytic application, filtration application, photovoltaic application, chemisorption application, biotechnology, biomedical application, fuel cell system, semiconductor application, micro-electronics, gas storage application, etc. ADVANTAGE - The porous structure is prepared with high catalytic activity, using the activated adsorbent material having high adsorption site density and adsorption capacity, and large surface area. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation of the structure, which involves providing the activated adsorbent material in a reactor, and performing at least one atomic layer deposition cycle to deposit metal material by introducing a precursor gas (P1) into the reactor to provide a metal material precursor deposited on the surface of the activated adsorbent material, and introducing a precursor gas (P2) into the reactor to provide the structure. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of an atomic layer deposition apparatus. Atomic layer deposition apparatus (900) Closing valve (906) Opening valves (908,909)