• 专利标题:   Schottky-MOS hybrid structure based photo-negative resistance device, has oxide isolating layer whose upper surface is surrounded by graphene thin film, where lower surface of semiconductor substrate is provided with bottom electrode.
  • 专利号:   CN108155267-A
  • 发明人:   XU Y, LI W, GUO H, LIU W, WAN X, LIU L, LV J, LI L, HU L, LIU C, YU B
  • 专利权人:   UNIV ZHEJIANG
  • 国际专利分类:   H01L031/108, H01L031/11, H01L031/113
  • 专利详细信息:   CN108155267-A 12 Jun 2018 H01L-031/11 201845 Pages: 6 Chinese
  • 申请详细信息:   CN108155267-A CN11295008 08 Dec 2017
  • 优先权号:   CN11295008

▎ 摘  要

NOVELTY - The device has a semiconductor substrate (2) whose upper surface is arranged with an oxide isolating layer (3). An upper surface of the oxide isolating layer is mounted with an annular top electrode (5), where boundary part of the top electrode is less a boundary part of the oxide isolating layer. The oxide isolating layer is provided with a circular oxide layer window (4) that is connected with the annular top electrode. The semiconductor substrate is arranged in a window area. An upper surface of the oxide isolating layer is surrounded by a graphene thin film through the annular top electrode. A lower surface of the semiconductor substrate is provided with a bottom electrode (1). USE - Schottky-MOS hybrid structure based photo-negative resistance device. ADVANTAGE - The device has low cost, large negative resistance interval, rapid response speed and easy integration effect. DESCRIPTION OF DRAWING(S) - The drawing shows a perspective view of a schottky-MOS hybrid structure based photo-negative resistance device. Bottom electrode (1) Semiconductor substrate (2) Oxide isolating layer (3) Circular oxide layer window (4) Annular top electrode (5)