▎ 摘　　要

NOVELTY - The pellicle (800) comprises a metal catalyst layer mounted on a substrate, and a barrier layer is mounted between the substrate and the metal catalyst layer. A pellicle membrane (430) is provided on the metal catalyst layer, and the pellicle membrane includes a two-dimensional (2D) material. The pellicle membrane has a central region (430c) and an edge region, and the edge region partially surrounds the central region, where the substrate and the metal catalyst layer collectively support the edge region of the pellicle membrane and do not support the central region of the pellicle membrane. Te barrier layer includes silicon dioxide, silicon nitride, and tantalum nitride. The 2D material includes silicon, phosphorus, boron, and graphene. The metal catalyst layer includes platinum, copper, nickel, carbon monoxide, silver, tungsten, molybdenum, palladium, and ruthenium. USE - Pellicle for use in a reticle (claimed) for protecting a photomask. ADVANTAGE - The protection films reinforce the durability of the pellicle membrane, and reduce or minimize deformation of the pellicle membrane that occur due to accumulation of heat in an exposing process in which light of an extreme ultraviolet ray (EUV) wavelength spectrum of light is used. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for: (a) a method for manufacturing a pellicle configured to protect a photomask; (b) a reticle comprising a photomask including a mask pattern. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of a pellicle. Limited region (410b) Inner region (410c) Pellicle membrane (430) Central region (430c) Pellicle (800)