▎ 摘　　要

NOVELTY - A graphene structure is formed by preparing to-be-processed substrate, pre-processing by supplying 1st gas containing carbon containing gas to to-be-processed substrate while heating the to-be-processed substrate without using a plasma, and forming a graphene structure on the surface of to-be-processed substrate after pre-processing on the surface of to-be-processed substrate by plasma chemical vapor deposition (CVD) using the plasma of 2nd process gas containing carbon containing gas. USE - Formation of graphene structure. ADVANTAGE - The method forms graphene structure with high coating property. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for apparatus for forming graphene structure comprising processing container which accommodates a to-be-processed substrate, heating mechanism which heats to-be-processed substrate, plane slot antenna which is arranged on processing container through microwave permeation board which consists of dielectric material which comprises the ceiling wall of processing container and which has a slot, microwave introduction mechanism which introduces microwave in processing container through the slot and microwave permeation board, gas introducing mechanism which supplies the process gas containing carbon containing gas and oxidizing gas in the processing container, exhaustion mechanism which exhausts the inside of processing container, and control unit which controls the heating mechanism, microwave introduction mechanism, gas introducing mechanism, and exhaustion mechanism.