▎ 摘　　要

NOVELTY - The method involves etching a graphene high sensitivity photoelectric detector to form a concave portion on a hard substrate. A bonding surface is placed in de-ionized water for ultrasonic cleaning. Bonding liquid is coated on the bonding surface after cleaning. The concave portion of the hard substrate is aligned with a convex portion of a brittle substrate. Temperature of a bonded substrate is maintained until the brittle substrate is stripped from a defect layer. A dielectric layer is formed on an upper surface of an isolation layer. A portion of the dielectric layer is removed. Transparent reaction precursor solution is obtained. The precursor solution is added into a reaction kettle to react to obtain a dark brown product. Methylene dichloride is added into the dark brown product for extracting. A graphene film is formed on a copper foil substrate. USE - Method for manufacturing a graphene high sensitivity photoelectric detector. Uses include but are not limited to ray measurement and detection, industrial automatic control and photometric quantity meter fields. ADVANTAGE - The method enables achieving high sensitivity to increase response speed of the graphene high sensitivity photoelectric detector with wide application prospect. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a method for manufacturing graphene high sensitivity photoelectric detector. (Drawing includes non-English language text).