• 专利标题:   Thermal conditioning apparatus for use in e.g. lithographic apparatus, has thermal conditioning fluid and solid thermal conductor that are arranged within channel, where conductor is in thermal communication with heat sink.
  • 专利号:   WO2023016734-A1, TW202314999-A
  • 发明人:   JIN W, KLUGKIST J A, VAN BERKEL K, VAN DEN BOOM J D, SCHNEIDERS M G, DOLK V S
  • 专利权人:   ASML NETHERLANDS BV
  • 国际专利分类:   G03F007/20, H01L023/46
  • 专利详细信息:   WO2023016734-A1 16 Feb 2023 G03F-007/20 202319 Pages: 42 English
  • 申请详细信息:   WO2023016734-A1 WOEP069419 12 Jul 2022
  • 优先权号:   EP191043, EP152539, EP165488

▎ 摘  要

NOVELTY - The apparatus has channels (16) within which thermal conditioning fluid (17) and a solid thermal conductor (18) are placed, where the thermal conductor is in thermal communication with a heat sink. The thermal conductor comprises first part arranged in the channel and second part arranged outside the channel, where the apparatus is configured such that the fluid is static within the channel in normal use. The solid thermal conductor is selected from ceramic, metal, ceramic-metal or flexible composite material, where the material is selected from silicon carbide, silicon nitride, silicon infiltrated silicon carbide, silicon infiltrated silicon nitride, diamond infiltrated silicon carbide, diamond infiltrated silicon nitride, diamond, polycrystalline diamond, graphene, silicon nitride, aluminum, aluminum silicon carbide, aluminum nitride and polyethylene infiltrated with carbon nanotubes. USE - Thermal conditioning apparatus for use in a lithographic apparatus used in manufacture of an integrated circuit. ADVANTAGE - The apparatus reduces print-through of optical elements by reducing maximum temperature of local hot spots, thus reducing pressure of the thermal conditioning fluid. The solid thermal conductor is configured to conduct thermal energy away from or to the component being conditioned, thus transferring heat readily. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: a system or sub-system for a lithographic apparatus a method for conditioning a system or sub-system a lithographic method an optical element for a lithographic apparatus. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view depicting a cooling mode. 15Mirror 16Channels 17Thermal conditioning fluid 18Solid thermal conductor