▎ 摘　　要

NOVELTY - Graphene preparation system comprises a cavity (1), a feeding funnel (2), a microwave generator (3), a placement frame (4), a support spring (5), and an oscillating unit and an exhaust fan, where the inside of the cavity is a reaction chamber, where the lower end of the cavity is provided with a discharge port. The feeding funnel is located at the upper end of the cavity. The feeding funnel is connected to the cavity and the feeding funnel is the inlet of the graphite particles into the reaction chamber. The microwave generator is located on an inner wall of the cavity and the microwave generator is used for microwave irradiation of the graphite oxide particles. The support spring is located at a lower portion of the cavity and the support spring for supporting the placement frame. The placement frame is located in the middle of the cavity and the placement frame is provided with a leakage hole for the leakage of the graphene. USE - Used as graphene preparation system. ADVANTAGE - The system quickly oxidize the graphite oxide particles by microwave irradiation and reduces to graphene and preparation is fast and has high quality. DETAILED DESCRIPTION - Graphene preparation system comprises a cavity (1), a feeding funnel (2), a microwave generator (3), a placement frame (4), a support spring (5), and an oscillating unit and an exhaust fan, where the inside of the cavity is a reaction chamber, where the lower end of the cavity is provided with a discharge port. The feeding funnel is located at the upper end of the cavity. The feeding funnel is connected to the cavity and the feeding funnel is the inlet of the graphite particles into the reaction chamber. The microwave generator is located on an inner wall of the cavity and the microwave generator is used for microwave irradiation of the graphite oxide particles. The support spring is located at a lower portion of the cavity and the support spring for supporting the placement frame. The placement frame is located in the middle of the cavity and the placement frame is provided with a leakage hole for the leakage of the graphene and the placement frame is used for placing the graphite oxide particles. The oscillating unit is located at a lower end of the placement frame and the oscillating unit is configured to tremble the graphite oxide particles on the placement frame. The exhaust fan is located at the bottom of the cavity and the exhaust fan is used to suck out the graphene in the reaction chamber and the exhaust fan provides power for the oscillating unit to tremble. DESCRIPTION OF DRAWING(S) - The diagram shows a schematic representation of the graphene preparation system. Cavity (1) Feeding funnel (2) Microwave generator (3) Placement frame (4) Support spring (5)