▎ 摘　　要

NOVELTY - The method involves covering a semiconductor substrate surface with graphene to form a graphene micro-region and a conductive probe-region. The conductive probe region is connected with a Kelvin probe force microscope to measure actual work function of the graphene micro-region, so as to obtain barrier height of the graphene micro-region. The semiconductor substrate is connected between the conductive probe region and a conductive atomic force microscope. A mobility value of graphene micro-region is calculated according to an effective contact radius of a conductive needle tip. USE - Method for measuring a mobility value of a graphene micro-region in a semiconductor substrate. ADVANTAGE - The method enables measuring mobility value of the graphene micro-region in the semiconductor substrate in an effective manner. DESCRIPTION OF DRAWING(S) - The drawing shows a circuit block diagram of a semiconductor substrate.